September 25, 2021

CHICAGO PIXELS

SEMICONDUCTOR RESEARCH CENTER

A Custom Layout Environment for SOC Design Closure

Throughout the process of physical design and verification there are many groups working on the design. Most often these groups are working independently or in parallel but separately, using their own specialized tools, such as P&R, DRC, custom layout, DFM, etc. At the end of the process there is an inevitable requirement… Read More

The post A Custom Layout Environment for SOC Design Closure appeared first on SemiWiki.