December 8, 2021

CHICAGO PIXELS

SEMICONDUCTOR RESEARCH CENTER

At the SPIE Advanced Lithography Conference in February 2021, Regina Freed of Applied Materials gave a paper: “Module-Level Material Engineering for Continued DRAM Scaling”. Applied Materials provided me with the presentation and was kind enough to set up an interview for me with Regina Freed.

I also spoke to Regina Freed last… Read More

The post SPIE 2021 – Applied Materials – DRAM Scaling appeared first on SemiWiki.